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Study of SF 6 and SF 6 /O 2 plasmas in a hollow cathode reactive ion etching reactor using Langmuir probe and optical emission spectroscopy techniques

✍ Scribed by Pessoa, R S; Tezani, L L; Maciel, H S; Petraconi, G; Massi, M


Book ID
119969176
Publisher
Institute of Physics
Year
2010
Tongue
English
Weight
310 KB
Volume
19
Category
Article
ISSN
0963-0252

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