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Study of photoluminescence of SiOxNyfilms implanted with Ge+ions and annealed under the conditions of hydrostatic pressure

โœ Scribed by I. E. Tyschenko; K. S. Zhuravlev; E. N. Vandyshev; A. Misiuk; R. A. Yankov; L. Rebohle; W. Skorupa


Book ID
110126159
Publisher
Springer
Year
2001
Tongue
English
Weight
146 KB
Volume
35
Category
Article
ISSN
1063-7826

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