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Properties of Ge nanocrystals formed by implantation of Ge+ions into SiO2films with subsequent annealing under hydrostatic pressure

โœ Scribed by I. E. Tyschenko; A. B. Talochkin; A. G. Cherkov; K. S. Zhuravlev; A. Misiuk; M. Voelskow; W. Skorupa


Book ID
110134190
Publisher
Springer
Year
2003
Tongue
English
Weight
94 KB
Volume
37
Category
Article
ISSN
1063-7826

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