Iron thin films have been grown by DC magnetron sputtering using Si(100) wafers as substrates, and then oxidized in a well-controlled oxygen atmosphere in the vacuum chamber. Film thickness is about 50 nm, and grains forming these samples do not exceed 20 nm. In order to control structural propertie
✦ LIBER ✦
Study of nanoconductive and magnetic properties of nanostructured iron films prepared by sputtering at very low temperatures
✍ Scribed by F. Jiménez-Villacorta; C. Munuera; C. Ocal; C. Prieto
- Book ID
- 106477369
- Publisher
- Springer Netherlands
- Year
- 2009
- Tongue
- English
- Weight
- 719 KB
- Volume
- 12
- Category
- Article
- ISSN
- 1388-0764
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