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Studies on the residual stress of fluorine-doped SnO2 film deposited by chemical vapor deposition

✍ Scribed by Jingkai Yang; Hongli Zhao; Qian Chen; Shengbo Liu; Hesong Sha; Fucheng Zhang

Book ID: 113937679
Publisher: Elsevier Science
Year: 2012
Tongue: English
Weight: 545 KB
Volume: 520
Category: Article
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2012.04.032

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