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Structure of Ir-Al2O3coatings obtained by chemical vapor deposition in the hydrogen atmosphere

✍ Scribed by N. V. Gelfond; N. B. Morozova; I. K. Igumenov; E. S. Filatov; S. A. Gromilov; R. I. Kvon


Book ID
106427833
Publisher
SP MAIK Nauka/Interperiodica
Year
2009
Tongue
English
Weight
205 KB
Volume
50
Category
Article
ISSN
0022-4766

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## Abstract We have deposited indium oxide (In~2~O~3~) films on silicon substrates by the metal organic chemical vapor deposition (MOCVD). We have investigated the effect of substrate temperature on growth and structural properties of films in the range of 200–300 Β°C. The films had a preferred orie