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Structure Characterization of (Al,Ga)N Epitaxial Layers by Means of X-Ray Diffractometry

✍ Scribed by J. Kozłowski; R. Paszkiewicz; M. Tłaczała


Publisher
John Wiley and Sons
Year
2001
Tongue
English
Weight
103 KB
Volume
228
Category
Article
ISSN
0370-1972

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## Thin (x = 0-30 at.% ) alloy Ðlms prepared by a reactive radio frequency (r.f.) sputtering (Co 0.8 Al 0.2 ) 100-x N x method were characterized by XPS and x-ray di †raction (XRD). The Ðlm with no nitrogen consisted of a CsCltype CoAl metallic compound, while the nitrogen-containing alloys were c