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Structure and properties of silicon dioxide thermal films I. SiO2 films of up to 50 nm thickness

✍ Scribed by Rumak, N. V. ;Khatko, V. V. ;Plotnikov, V. N.

Publisher: John Wiley and Sons
Year: 1984
Tongue: English
Weight: 561 KB
Volume: 86
Category: Article
ISSN: 0031-8965
DOI: 10.1002/pssa.2210860108

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