Structure and properties of silicon dioxide thermal films. II. 110 nm thick SiO2 films
β Scribed by Rumak, N. V. ;Khatko, V. V.
- Publisher
- John Wiley and Sons
- Year
- 1984
- Tongue
- English
- Weight
- 592 KB
- Volume
- 86
- Category
- Article
- ISSN
- 0031-8965
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