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Structure and optical properties of InN and InAlN films grown by rf magnetron sputtering

โœ Scribed by Hong He; Yongge Cao; Renli Fu; Hai Wang; Jiquan Huang; Changgang Huang; Meili Wang; Zhonghua Deng

Publisher
Springer US
Year
2009
Tongue
English
Weight
468 KB
Volume
21
Category
Article
ISSN
0957-4522

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## Abstract Rf magnetron sputtering technique was employed for preparation of tantalum oxide films on quartz and crystalline silicon (111) substrates held at room temperature by sputtering of tantalum in an oxygen partial pressure of 1x10^โ€4^ mbar. The films were annealed in air for an hour in the