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Structure and electrical properties of CdIn2O4 thin films prepared by DC reactive magnetron sputtering

โœ Scribed by F.F. Yang; L. Fang; S.F. Zhang; J.S. Sun; Q.T. Xu; S.Y. Wu; J.X. Dong; C.Y. Kong


Book ID
108060510
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
601 KB
Volume
254
Category
Article
ISSN
0169-4332

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Thin films of ZrO 2 were prepared by reactive magnetron sputtering. Annealing of the films exhibited a drastic change in the properties due to improved crystallinity and packing density. The root mean square roughness of the sample observed from atomic force microscope is about 5.75 nm which is comp