Structural properties of quaternary InAlGaN MQW grown by plasma-assisted MBE
✍ Scribed by Dimitrakopulos, G. P. ;Kioseoglou, J. ;Dimakis, E. ;Georgakilas, A. ;Nouet, G. ;Komninou, Ph.
- Book ID
- 105363663
- Publisher
- John Wiley and Sons
- Year
- 2006
- Tongue
- English
- Weight
- 398 KB
- Volume
- 203
- Category
- Article
- ISSN
- 0031-8965
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✦ Synopsis
Abstract
Quaternary In~0.085~Al~0.285~Ga~0.63~N/GaN multiple quantum wells (MQW) grown by plasma‐assisted molecular beam epitaxy are characterized by high resolution transmission electron microscopy (HRTEM), geometric phase analysis, and energy dispersive X‐ray (EDX) nano‐analysis. The MQW exhibit sharp well‐defined InAlGaN/GaN interfaces while the GaN/InAlGaN interfaces are more smeared. The InAlGaN quantum wells and the GaN barriers are lattice‐matched. Chemical distribution profiles are extracted from EDX line scans, obtained with a nanoprobe, which are compared to convoluted theoretical profiles, and are in good agreement with the HRTEM observations. Indium clustering occurs after prolonged observation under the electron beam. (© 2006 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
📜 SIMILAR VOLUMES
This work presents a comparative study of the growth by plasma-assisted molecular beam epitaxy (MBE) of GaN layers on four different substrates: Si(111), Al 2 O 3 (0001), GaN/Al 2 O 3 and ELOG GaN/Al 2 O 3 templates. Optimization of the growth parameters for the case of growth of GaN layers on silic