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Structural characteristics of semipolar InN (112l) films grown on yttria stabilized zirconia substrates

✍ Scribed by Fujii, Tomoaki ;Kobayashi, Atsushi ;Ohta, Jitsuo ;Oshima, Masaharu ;Fujioka, Hiroshi


Book ID
105366194
Publisher
John Wiley and Sons
Year
2010
Tongue
English
Weight
181 KB
Volume
207
Category
Article
ISSN
0031-8965

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✦ Synopsis


Abstract

We report on the growth of semipolar InN ($11\overline {2} l$) films on yttria stabilized zirconia (YSZ) substrates by pulsed laser deposition. We found that the growth orientation can be precisely controlled by utilizing the tendency for the epitaxial relationships of InN [0001] || YSZ [111] and InN [$11\overline {2} 0$] || YSZ [$1\overline {1} 0$] to be maintained. The full‐width at half‐maximum of the $11\overline {2} 6$ X‐ray rocking curves for an InN ($11\overline {2} 7$) film varies from 0.61 to 0.46Β° depending on the X‐ray angle of incidence.


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Layers of yttria-stabilized zirconia with different yttria content were prepared using MOCVD. The variation of the crystallographic parameters of the cell, as well as the residual stress of the deposits have been studied by XRD as a function of yttria content. The maximum value of the stress has bee