Structural and electronic properties of silicon nitride materials
β Scribed by F. De Brito Mota; J. F. Justo; A. Fazzio
- Publisher
- John Wiley and Sons
- Year
- 1998
- Tongue
- English
- Weight
- 341 KB
- Volume
- 70
- Category
- Article
- ISSN
- 0020-7608
No coin nor oath required. For personal study only.
β¦ Synopsis
We developed an empirical potential for interactions between Si and N to describe silicon nitride systems using the Tersoff functional form. With this model, we explored the structural properties of amorphous silicon nitride through the Monte Carlo simulations and compared them to available experimental data. The empirical model Ε½ . provided a very good description of such properties for a y SiN 0x -1.5 . Electronic x structure of amorphous and point defects in crystalline silicon nitride were then studied using first-principles calculations. For such calculations, the configurations were created by the empirical model, with the relaxed structures used as input for the first-principles calculations. Atomic relaxation was later allowed in the first-principles calculations.
π SIMILAR VOLUMES
Silicon nitride powders characterized by a high specific surface area were prepared by gas-phase ammonolysis of tetrachlorosilane. The compositions as well as the structural and textural properties of the materials were varied by the reaction conditions and the aftertreatment of the synthesis produc
Using a molecular cluster with 71 atoms, we studied the electronic and structural properties of nitrogen vacancy, boron antisite, and oxygen in cubic boron nitride through an ab initio HartreeαFock calculation. We found that all defects introduce a deep state above the middle-energy gap. These defec