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Structural and electrical properties of Ta2O5thin films prepared by photo-induced CVD

โœ Scribed by JUN LIU; AIXIANG WEI; XIANGHUI ZHAO; HAIYAN ZHANG


Publisher
Springer-Verlag
Year
2011
Tongue
English
Weight
281 KB
Volume
34
Category
Article
ISSN
0250-4707

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Thin films of TiO 2 were grown on n-type Si substrate by thermal oxidation of Ti films deposited by dc sputtering. The phase purity of TiO 2 was confirmed by Raman spectroscopy, and secondary ion mass spectroscopy was used to analyze the interfacial and chemical composition of the TiO 2 thin films.