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Structural and compositional studies of magnetron-sputtered Nd–Fe–B thin films on Si(100)

✍ Scribed by G. K Muralidhar; B Window; D. K Sood; R. B Zmood


Book ID
111533678
Publisher
Springer
Year
1998
Tongue
English
Weight
772 KB
Volume
33
Category
Article
ISSN
0022-2461

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Titanium dioxide films have been deposited using DC magnetron sputtering technique onto well-cleaned p-silicon substrates at an oxygen partial pressure of 7 Â 10 -5 mbar and at a sputtering pressure (Ar+O 2 ) of 1 Â 10 -3 mbar. The deposited films were calcinated at 673 and 773 K. The composition of