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Stress in Al, AlSiCu, and AlVPd films on oxidized Si substrates

✍ Scribed by G.J. Leusink; J.P. Lokker; M.J.C. van den Homberg; J.F. Jongste; T.G.M. Oosterlaken; G.C.A.M. Janssen; S. Radelaar

Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
325 KB
Volume
91
Category
Article
ISSN
0169-4332

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