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Stress characteristics in EUV mask Mo/Si multilayers deposited by ion beam sputtering

โœ Scribed by C. Teyssier; E. Quesnel; V. Muffato; P. Schiavone

Book ID
114155437
Publisher
Elsevier Science
Year
2002
Tongue
English
Weight
187 KB
Volume
61-62
Category
Article
ISSN
0167-9317

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We have fabricated Mo/Si bi-layer and multilayer films under the Xe gas pressures in the range of 0.005-0.1 Pa and the throw distance between the substrate and target longer than 200 mm by using the twocathode superconducting magnetron sputtering apparatus and studied the effect of deposition condit