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Characteristics of Ta and Mo thin films deposited by high current ion beam sputtering

✍ Scribed by Kiyoshi Ishii; Masahiko Naoe; Shun'Ichi Yamanakas

Book ID: 112074915
Publisher: John Wiley and Sons
Year: 1980
Tongue: English
Weight: 653 KB
Volume: 63
Category: Article
ISSN: 8756-6621
DOI: 10.1002/ecja.4410630114

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