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Deposition Characteristics of AlN Thin Film Prepared by the Dual Ion Beam Sputtering System

✍ Scribed by T. L. Hu; S. W. Mao; C. P. Chao; M. F. Wu; H. L. Huang; D. Gan

Book ID: 107453539
Publisher: Springer US
Year: 2006
Tongue: English
Weight: 460 KB
Volume: 36
Category: Article
ISSN: 0361-5235
DOI: 10.1007/s11664-006-0023-2

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