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Stress and property control in sputtered metal films without substrate bias

✍ Scribed by D.W. Hoffman


Publisher
Elsevier Science
Year
1983
Tongue
English
Weight
326 KB
Volume
107
Category
Article
ISSN
0040-6090

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✍ M. Gioti; S. Logothetidis; C. Charitidis; H. Lefakis πŸ“‚ Article πŸ“… 1999 πŸ› Elsevier Science 🌐 English βš– 116 KB

## Nitrogenated amorphous carbon films (a-CN V ) were prepared by reactive magnetron sputtering at room temperature with different substrate bias voltage (Β» ) and N concentration in the plasma. In situ spectroscopic ellipsometry (SE) data analysis was used to monitor the composition and the film t