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Stress analyses of GaN film manufactured by ECR plasma-enhanced chemical vapor deposition

✍ Scribed by Fu Silie; Chen Junfang; Gao Peng; Wang Chun-ann

Book ID: 113940959
Publisher: Elsevier Science
Year: 2012
Tongue: English
Weight: 829 KB
Volume: 86
Category: Article
ISSN: 0042-207X
DOI: 10.1016/j.vacuum.2011.12.021

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