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Strained-Si nMOSFET formed on very thin SiGe buffer layer fabricated by ion implantation technique

โœ Scribed by K. Sawano; A. Fukumoto; Y. Hoshi; K. Nakagawa; Y. Shiraki


Book ID
108290199
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
309 KB
Volume
517
Category
Article
ISSN
0040-6090

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