Fabrication of strained Si nMOSFET transistors on thin buffer layers with selective and non-selective epitaxial growth techniques

✍ Scribed by Geert Eneman; Peter Verheyen; Rita Rooyackers; Romain Delhougne; Roger Loo; Matty Caymax; Philippe Meunier-Beillard; Kristin De Meyer; Wilfried Vandervorst

• Publisher: Elsevier Science
• Year: 2005
• Tongue: English
• Weight: 310 KB
• Volume: 8
• Category: Article
• ISSN: 1369-8001
• DOI: 10.1016/j.mssp.2004.09.073