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Stoichiometry of Nickel Oxide Films Prepared by ALD

✍ Scribed by Julien Bachmann; Andriy Zolotaryov; Ole Albrecht; Silvana Goetze; Andreas Berger; Dietrich Hesse; Dmitri Novikov; Kornelius Nielsch

Publisher: John Wiley and Sons
Year: 2011
Tongue: English
Weight: 357 KB
Volume: 17
Category: Article
ISSN: 0948-1907
DOI: 10.1002/cvde.201004300

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