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Status and critical challenges for 157-nm lithography

✍ Scribed by K. Ronse; P. De Bisschop; A.M. Goethals; J. Hermans; R. Jonckheere; S. Light; U. Okoroanyanwu; R. Watso; D. McAfferty; J. Ivaldi; T. Oneil; H. Sewell

Book ID: 113797567
Publisher: Elsevier Science
Year: 2004
Tongue: English
Weight: 448 KB
Volume: 73-74
Category: Article
ISSN: 0167-9317
DOI: 10.1016/j.mee.2004.02.007

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