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Statistical simulation of IC technology: A bipolar process example

✍ Scribed by T.J. Sanders; K. Rekab; S.H. Chung

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Statistical Simulation for Process Desig

✍ A. A. Kouleshoff; V. S. Malyshev; V. V. Nelayev; V. R. Stempitsky 📂 Article 📅 2003 🏛 Springer 🌐 English ⚖ 331 KB

A physical and computationally efficient

✍ Hae-Seok Cho; Jerry G Fossum 📂 Article 📅 1995 🏛 Elsevier Science 🌐 English ⚖ 855 KB

A 20-ps Si bipolar IC using advanced sup

✍ Konaka, S.; Yamamoto, E.; Sakuma, K.; Amemiya, Y.; Sakai, T. 📂 Article 📅 1989 🏛 IEEE 🌐 English ⚖ 608 KB

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✍ Zucca, R.; Welch, B.M.; Eden, R.C.; Long, S.I. 📂 Article 📅 1979 🏛 IEEE 🌐 English ⚖ 297 KB

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✍ Yamaguchi, T.; Archer, T.M.; Johnston, R.E.; Lee, J.S. 📂 Article 📅 1994 🏛 IEEE 🌐 English ⚖ 734 KB

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✍ Brown, A.R.; Huard, V.; Asenov, A. 📂 Article 📅 2010 🏛 IEEE 🌐 English ⚖ 635 KB