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Statistical analysis of the effect of deposition parameters on the preferred orientation of sputtered AlN thin films

✍ Scribed by V.M. Pantojas; W. Otaño-Rivera; José N. Caraballo

Book ID
108287916
Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
215 KB
Volume
492
Category
Article
ISSN
0040-6090

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