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Staebler-wronski effect in a-Si:H films with different morphology

✍ Scribed by Hideki Ohagi; Motoharu Yamazaki; Jun-ichi Nakata; Shozo Imao; Junji Shirafuji; Keiji Fujibayashi; Yoshio Inuishi


Publisher
Elsevier Science
Year
1988
Tongue
English
Weight
381 KB
Volume
33-34
Category
Article
ISSN
0169-4332

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The reaction of dimethylaluminum hydride (DMAH) with a-Si:H:F films prepared by spontaneous chemical vapor deposition (SCVD) has been studied in situ using polarization modulation IR spectroscopy. It is found that SCVD films before DMAH exposure contain SiF2, SiHzF , and Sill 2 species. Upon exposur