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Stabilizing Small Molecules on Metal Oxide Surfaces Using Atomic Layer Deposition

✍ Scribed by Hanson, Kenneth; Losego, Mark D.; Kalanyan, Berç; Parsons, Gregory N.; Meyer, Thomas J.

Book ID
120972593
Publisher
American Chemical Society
Year
2013
Tongue
English
Weight
694 KB
Volume
13
Category
Article
ISSN
1530-6984

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Atomic layer deposition (ALD) of smooth and highly conformal films of hafnium and zirconium oxides was studied using six metal alkylamide precursors for hafnium and zirconium. Water was used as an oxygen source during these experiments. As deposited, these films exhibited a smooth surface with a mea