SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Sub-100 nm T-gates utilizing a single E-beam lithography exposure process

✍ Scribed by Ainley, Eric S.; Ageno, Scott; Nordquist, Kevin J.; Resnick, Douglas J.; Fedynyshyn, Theodore H.

• Book ID: 118149457
• Publisher: SPIE
• Year: 2002
• Weight: 541 KB
• Volume: 4690
• Category: Article
• DOI: 10.1117/12.474192