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SPIE Proceedings [SPIE SPIE Lithography Asia - Taiwan - Taipei, Taiwan (Tuesday 4 November 2008)] Lithography Asia 2008 - Orientation Zernike Polynomials: a systematic description of polarized imaging using high NA lithography lenses

✍ Scribed by Heil, Tilmann; Ruoff, Johannes; Neumann, Jens Timo; Totzeck, Michael; Krähmer, Daniel; Geh, Bernd; Gräupner, Paul; Chen, Alek C.; Lin, Burn; Yen, Anthony

Book ID: 120552571
Publisher: SPIE
Year: 2008
Weight: 646 KB
Volume: 7140
Category: Article
DOI: 10.1117/12.805438

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