SPIE Proceedings [SPIE SPIE Lithography Asia - Taiwan - Taipei, Taiwan (Tuesday 4 November 2008)] Lithography Asia 2008 - A novel curve-fitting procedure for determining proximity effect parameters in electron beam lithography

✍ Scribed by Liu, Chun-Hung; Ng, Hoi-Tou; Ng, Philip C. W.; Tsai, Kuen-Yu; Lin, Shy-Jay; Chen, Jeng-Homg; Chen, Alek C.; Lin, Burn; Yen, Anthony

• Book ID: 121355055
• Publisher: SPIE
• Year: 2008
• Weight: 386 KB
• Volume: 7140
• Category: Article
• DOI: 10.1117/12.804693