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SPIE Proceedings [SPIE SPIE Lithography Asia - Taiwan - Taipei, Taiwan (Tuesday 4 November 2008)] Lithography Asia 2008 - Extending KrF lithography beyond 80nm with the TWINSCAN XT:1000H 0.93NA scanner

✍ Scribed by de Boeij, Wim; Dicker, Gerald; de Wit, Marten; Bornebroek, Frank; Zellenrath, Mark; Voorma, Harm-Jan; Smeets, Bart; Toussaint, Rene; Paarhuis, Bart; de Jong, Marteijn; Hellweg, Dirk; Kornitzer, Klaus; Chen, Alek C.; Lin, Burn; Yen, Anthony

Book ID: 120468056
Publisher: SPIE
Year: 2008
Weight: 852 KB
Volume: 7140
Category: Article
DOI: 10.1117/12.805381

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