✦ LIBER ✦

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Design for Manufacturability through Design-Process Integration V - A new fast resist model: the Gaussian LPM

✍ Scribed by Mack, Chris A.; Rieger, Michael L.

No coin nor oath required. For personal study only.

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