SPIE Proceedings [SPIE Photomask Technology 2005 - Monterey, California (Monday 3 October 2005)] 25th Annual BACUS Symposium on Photomask Technology - Methods for benchmarking photolithography simulators: part III

✍ Scribed by Smith, Mark D.; Graves, Trey; Byers, Jeffrey D.; Mack, Chris A.; Weed, J. Tracy; Martin, Patrick M.

• Book ID: 120216291
• Publisher: SPIE
• Year: 2005
• Weight: 138 KB
• Volume: 5992
• Category: Article
• DOI: 10.1117/12.634465