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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Optical Microlithography XVI - Characterization of optical proximity matching for 130-nm node gate line width

✍ Scribed by Zheng, Sandra; Zhang, Gary; Wang, ChangAn; Detweiler, Shangting F.; Yen, Anthony

No coin nor oath required. For personal study only.

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