SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Optical Microlithography XVI - Optimizing and enhancing optical systems to meet the low k1 challenge

✍ Scribed by Flagello, Donis G.; Socha, Robert J.; Shi, Xuelong; van Schoot, Jan B.; Baselmans, Jan; van de Kerkhof, Mark A.; de Boeij, Wim; Engelen, Andre; Carpaij, Rene; Noordman, Oscar; Moers, Marco H. P.; Mulder, Melchior; Finders, Jo; van Greevenbroek, Henk; Schriever, Martin; Maul, Manfred; Haidner, Helmut; Goeppert, Markus; Wegmann, Ulrich; Graeupner, Paul; Yen, Anthony

• Book ID: 120469946
• Publisher: SPIE
• Year: 2003
• Weight: 594 KB
• Volume: 5040
• Category: Article
• DOI: 10.1117/12.485340