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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Optical Microlithography XVI - Optical rule checking for proximity-corrected mask shapes

✍ Scribed by Mukherjee, Maharaj; Baum, Zachary; Nickel, John; Dunham, Timothy G.; Yen, Anthony

No coin nor oath required. For personal study only.

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