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SPIE Proceedings [SPIE 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies - Dalian, China (Monday 26 April 2010)] 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems - Research on focusing technique based on dual-phase lock-in amplifier in 193nm lithography system

✍ Scribed by Xie, Fei; Tang, Xiaoping; Hu, Song; Yan, Wei; Ye, Tianchun; Han, Sen; Kameyama, Masaomi; Hu, Song

Book ID: 120368426
Publisher: SPIE
Year: 2010
Weight: 320 KB
Volume: 7657
Category: Article
DOI: 10.1117/12.866711

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