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SPIE Proceedings [SPIE 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies - Dalian, China (Monday 26 April 2010)] 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems - Phase demodulation method for fringe pattern in alignment of nanometer lithography

✍ Scribed by Xu, Feng; Hu, Song; Luo, Zhengquan; Zhou, Shaolin; Ye, Tianchun; Han, Sen; Kameyama, Masaomi; Hu, Song

Book ID: 120374174
Publisher: SPIE
Year: 2010
Weight: 332 KB
Volume: 7657
Category: Article
DOI: 10.1117/12.866811

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