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SPIE Proceedings [SPIE 27th European Mask and Lithography Conference - Dresden, Germany (Tuesday 18 January 2011)] 27th European Mask and Lithography Conference - Thermal nanoimprint (T-NIL) with photoresists for hybrid lithography

✍ Scribed by Dhima, Khalid; Steinberg, Christian; Möllenbeck, Saskia; Mayer, Andre; Scheer, Hella-Christin; Behringer, Uwe F.W.

No coin nor oath required. For personal study only.

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