✦ LIBER ✦
SPIE Proceedings [SPIE 29th European Mask and Lithography Conference - Dresden, Germany (Tuesday 25 June 2013)] 29th European Mask and Lithography Conference - Dose variation and charging due to fogging in electron beam lithography: simulations using CHARIOT Monte Carlo software
✍ Scribed by Babin, Sergey; Borisov, Sergey; Patyukova, Elena; Behringer, Uwe F. W.; Maurer, Wilhelm
- Book ID
- 121411672
- Publisher
- SPIE
- Year
- 2013
- Weight
- 619 KB
- Volume
- 8886
- Category
- Article
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