SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Emerging Lithographic Technologies II - EUV optical design for a 100-nm CD imaging system

✍ Scribed by Sweeney, Donald W.; Hudyma, Russell M.; Chapman, Henry N.; Shafer, David R.; Vladimirsky, Yuli

• Book ID: 121333380
• Publisher: SPIE
• Year: 1998
• Weight: 643 KB
• Volume: 3331
• Category: Article
• DOI: 10.1117/12.309559