✦ LIBER ✦
SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Optical Microlithography XI - Quasi-physical model for fast resist contour simulation: importance of lens aberrations and acid diffusion in LSI pattern design
✍ Scribed by Fukuda, Hiroshi; Hattori, Keiko T.; Van den Hove, Luc
- Book ID
- 120981936
- Publisher
- SPIE
- Year
- 1998
- Weight
- 413 KB
- Volume
- 3334
- Category
- Article
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