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Spectroscopic investigation of the discharge for PA-CVD of TiN

✍ Scribed by K. -T. Rie; A. Gebauer; J. Wöhle

Publisher
Springer
Year
1993
Tongue
English
Weight
637 KB
Volume
13
Category
Article
ISSN
0272-4324

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✍ K.-T. Rie; J. Wöhle 📂 Article 📅 1991 🏛 Elsevier Science 🌐 English ⚖ 245 KB

The plasma-assisted chemical vapour deposition process for deposition of steel substrates with TiN layers was investigated by optical emission spectroscopy. Several atomic lines and molecular bands were identified in the emitted spectrum of the discharge. The nitrogen in the discharge was found most