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Spectroscopic analysis of stress-induced defects in thin silicon oxide films

✍ Scribed by Kenji Komiya; Yasuhisa Omura

Book ID: 108411190
Publisher: Elsevier Science
Year: 2001
Tongue: English
Weight: 157 KB
Volume: 59
Category: Article
ISSN: 0167-9317
DOI: 10.1016/s0167-9317(01)00647-5

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