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Spectromicroscopic study of plasma-treatment effect on InP-substrate-based silicon nitride and silicon oxide patterns

✍ Scribed by M.-K. Lee; H.-J. Shin; J.-H. Choi; D.-S. Bang

Publisher: Springer
Year: 2004
Tongue: English
Weight: 470 KB
Volume: 78
Category: Article
ISSN: 1432-0630
DOI: 10.1007/s00339-002-2049-5

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P.O. Box 513, NL-5600 MB, Eindhoven (The Netherlands) [\*\*] The authors thank Semjon Shikin (NT-MDT, Moscow, Russia) for his help with the modulated friction force imaging and Alexander Alexeev and Dmitri Kozodaev for their valuable support and discussions. The Dutch Polymer Institute (DPI), Fundam