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Effect of plasma treatment on the microstructure and electrical properties of MIM capacitors with PECVD silicon oxide and silicon nitride

โœ Scribed by Chia-Cheng Ho; Bi-Shiou Chiou

Publisher
Springer
Year
2007
Tongue
English
Weight
455 KB
Volume
42
Category
Article
ISSN
0022-2461

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Effect of size and plasma treatment and the application of Weibull distribution on the breakdown of PECVD SiNx MIM capacitors
โœ Chia-Cheng Ho; Bi-Shiou Chiou ๐Ÿ“‚ Article ๐Ÿ“… 2008 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 151 KB

The dielectric breakdown field is one of the important concerns for device reliability. The breakdown of dielectric is originated at a fatal flaw that grows to cause failure and can be explained by the weakest-link theory. In this study, metal-insulator-metal (MIM) capacitors with plasma enhanced ch