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Oxidation Conditions for Octadecyl Trichlorosilane Monolayers on Silicon: A Detailed Atomic Force Microscopy Study of the Effects of Pulse Height and Duration on the Oxidation of the Monolayer and the Underlying Si Substrate

✍ Scribed by D. Wouters; R. Willems; S. Hoeppener; C. F. J. Flipse; U. S. Schubert

Publisher: John Wiley and Sons
Year: 2005
Tongue: English
Weight: 464 KB
Volume: 15
Category: Article
ISSN: 1616-301X
DOI: 10.1002/adfm.200400534

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✦ Synopsis

P.O. Box 513, NL-5600 MB, Eindhoven (The Netherlands) [**] The authors thank Semjon Shikin (NT-MDT, Moscow, Russia) for his help with the modulated friction force imaging and Alexander Alexeev and Dmitri Kozodaev for their valuable support and discussions. The Dutch Polymer Institute (DPI), Fundamenteel Onderzoek der Materie (FOM), NWO (VICI award), and the Fonds der Chemischen Industrie are acknowledged for their financial support.